Ultra-High Vacuum System is a perfect environment for advanced materials characterization, growth and processing.

Applications

The surface and interface processes at the atomic and molecular level are responsible for the performance of the wide range of technologies in microelectronics, computing, energy harvesting, energy storage, catalysis and medical devices.

The manufactured tools offers basic and fundamental properties characterization, experimental modelling and molecular beam epitaxy synthesis on metals, alloys, semiconductors, oxides, etc. In general, any surface crystallographic and compositional impact of chemical reactions at interface of solid state matter with gases, liquids and vacuum can be monitored.