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IntegraLEED Surface Crystallography Spectrometer

LEED 450 MAX MCP (Model BDL450-MAX-MCP) with Integral Retraction and Shutter

Miniature Instrument to Fit Any UHV System

Upgraded version of the LEED450 featuring maximized display size for Surface crystallography.


Description

The LEED 450-MAX-MCP combines cutting-edge Low-Energy Electron Diffraction (LEED) and Auger Electron Spectroscopy (AES) capabilities. Featuring a miniature electron gun, a set of concentric grids, and a conductive, phosphor-coated screen, and the superior signal amplification of single microchannel plates (MCP). The MCP provide a high gain enabling the use of ultra-low beam currents to produce clear, high-resolution LEED patterns while minimizing sample damage—ideal for delicate materials like ice and organics.

Designed for ease of use, the LEED 450-MAX-MCP operates with a modern digital power supplies and a robust retraction mechanism, ensuring smooth, dependable day-to-day operation, as trusted by our extensive user base for decades. The wide viewing angle (60° at 37 mm sample distance) and minimal screen shadowing by the electron gun maximize the visible LEED pattern, providing unparalleled clarity and precision for surface science research.


Features

  • Sufficient angular and energy resolution to detect surface reconstructions and composition changes
  • Miniature Electron Gun with double focusing
  • Superior magnetic shielding
  • Moiré pattern reduction
  • Suitable for “in situ” growth monitoring
  • Integral Linear Motion and Shutter
  • Low Outgassing Rate
  • Easy add-on AES
  • Convenient LEED image Capture with external camera
  • Simple and powerful operation with digital controller

Applications

Miniature model with maximized display for basic surface crystallography of single crystals and “in-situ” epitaxy.

The LEED 450 MAX-MCP is capable of providing LEED and AES data for a wide range of samples. The miniature instrument size allows for easy installation to smaller UHV systems.

Materials suitable for characterization should be single crystals and epitaxial films in categories such as: 2D materials, semiconductors, metals, oxides and magnetic films.

Drawings

For seamless integration, 3D step files are available for most models on the PDF Downloads page.

Layout of LEED 450 MAX MCP (Model BDL450-MAX-MCP) optic.

LEED 450 MAX MCP (Model BDL450-MAX-MCP) calculation formula for Flange-Sample distance & Retraction length:
FS = 165.5mm + 2 LMX – OV; where FS is the flange to sample distance, LMX is the retraction length and OV is the overlapping length.

Side view of LEED 450 MAX MCP (Model BDL450-MAX-MCP) optic.
Front view of LEED 450 MAX MCP (Model BDL450-MAX-MCP) optic.
Back view of LEED 450 MAX MCP (Model BDL450-MAX-MCP) optic.

Key Specifications

For detailed specifications, download LEED 450 MAX MCP Specifications (.pdf).

Optics
Glass-display Fused silica coated with indium-tin oxide conductive layer and P31 phosphor (ZnS:Ag:Cu-green, 525 nm wavelength)
Acceptance angle 60° angle of acceptance from sample at a distance of 37 mm
Retarding Field Analyser Concentric assembly of hemispherical grids
Working distance 10 mm from sample
Grid material Gold coated St-Steel wire mesh (100 mesh, 81% transparency)
Energy Resolution 0.2% - 0.5% at low modulation voltages
Monitoring 4.5 " standard viewport
Linear motion up to 100 mm retraction from sample; linear ball bearing and acme thread with all spring electr. connections
Integral Shutter Manual shutter driven by rotary feedthrough
Magnetic shielding Mu-metal cylinder with front cover for maximum attenuation
Assembly Extreme-high-vacuum compatibility with stainless steel, high alumina and Au-plated copper alloy materials
Mounting CF4.5" (DN63CF) With Oversized tubing 76 mm (3”) O.D
Bakeability Under vacuum, 250 °C maximum
Integral Miniature Electron Gun
Beam energy system LEED – 5 eV to 750 eV, AES – 5 eV to 3000 eV
Beam current LEED – 2 μA at 100 eV and 0.5 mm beam size, AES - up to 100 μA at 3 keV
Beam size from 1 mm to 250 μm - adjusted by Wehnelt potential, limited by exchangeable aperture down to 50 μm
Electron source Tungsten-2% thoriated filament standard, single crystal LaB6 filament optional
Energy spread 0.45 eV (thoriated - tungsten filament)
Overall size 10 mm lens diameter and 80 mm length
Working area 41 mm
L/D ratio 40:1
Channel diameter 12 microns
Center to center spacing 15 microns
Plate thickness 0.48 mm
Bias angle
Electron gain 104 to 105 per plate

Configuration Guide

Brochure