ocivm.com > LEED / AES Spectrometers > LEED 800 MCP 100DEG (Model BDL800IR-MCP-100DEG)
Figure 2. Model LPS075-D power supply for LEED operation. 
Figure 3. Model LPS300-D and LOA10-AES power supply for LEED and AES operation. 
Figure 4. Model MCPS01/02 power supply for microchannel plate operation. 
Figure 5. MultiLEED Software. 
Figure 6. AES Software. 
Figure 7. AES Software Images - element composition. 
Figure 8. LEED pattern of Germanium (100) with 120 eV beam energy. 
Figure 9. LEED pattern of Gallium Nitride (0001) with 64 eV beam energy. 
Figure 10. BP4 on Au (111) with 64 eV beam energy. -64eV.jpg)
Figure 11. BP3 on Au (111) with 69 eV beam energy. -69eV.jpg)
Figure 12. Auger spectrum of Gallium Nitride. 
Figure 13. Auger spectrum of Gold. 
The LEED 800 MCP-100DEG combines cutting-edge Low-Energy Electron Diffraction (LEED) and Auger Electron Spectroscopy (AES) capabilities with a wide viewing angle(100 °). Featuring a miniature electron gun, a set of concentric grids, and a conductive, phosphor-coated screen, and the superior signal amplification of single or dual microchannel plates (MCPs). The MCPs provide a high gain enabling the use of ultra-low beam currents to produce clear, high-resolution LEED patterns while minimizing sample damage—ideal for delicate materials like ice and organics.
Designed for ease of use, the LEED 800 MCP-100DEG operates with a modern digital power supplies and a robust retraction mechanism, ensuring smooth, dependable day-to-day operation, as trusted by our extensive user bas for decades. The wide viewing angle (100 ° at 33 mm sample distance) and minimal screen shadowing by the electron gun maximize the visible LEED pattern, providing unparalleled clarity and precision for surface science research.
The LEED 800 MCP is especially good at providing LEED and AES data of organic samples. The larger size allows for higher angular and energy resolution and the gain from the MCPs allows better focusing of LEED imaging.
For seamless integration, 3D step files are available for most models on the PDF Downloads page.
LEED 800 MCP (Model BDL800IR-MCP) calculation formula for Flange-Sample distance
& Retraction length:
FS = 165.5mm + 2 LMX – OV; where FS is the flange to sample distance, LMX is the retraction
length and OV is the overlapping length.
For detailed specifications, download LEED 800 MCP 100DEG Specifications (.pdf).
| Optics | |
|---|---|
| Glass-display | Fused silica coated with indium-tin oxide conductive layer and P31 phosphor (ZnS:Ag:Cu-green, 525 nm wavelength) |
| Acceptance angle | 100° angle of acceptance from sample at a distance of 33 mm |
| Retarding Field Analyser | Concentric assembly of hemispherical grids |
| Working distance | 10 mm from sample |
| Grid material | Gold coated St-Steel wire mesh (100 mesh, 81% transparency) |
| Energy Resolution | 0.2% - 0.5% at low modulation voltages |
| Monitoring | 8" standard viewport |
| Linear motion | Up to 150 mm retraction from sample; linear ball bearing and acme thread with all spring electr. connections |
| Integral Shutter | Manual shutter driven by rotary feedthrough |
| Magnetic shielding | Mu-metal cylinder with front cover for maximum attenuation |
| Assembly | Extreme-high-vacuum compatibility with stainless steel, high alumina and Au-plated copper alloy materials |
| Mounting | CF8" (DN150CF) double sided conflat flange with sample distance 145 mm – 400 mm |
| Bakeability | Under vacuum, 250 °C maximum |
| Integral Miniature Electron Gun | |
| Beam energy system | LEED – 0 eV to 750 eV, AES – 0 eV to 3000 eV |
| Beam current | LEED – 2 µA at 100 eV and 0.5mm beam size, AES - up to 100 µA at 3 keV |
| Beam size | from 1 mm to 250 µm - adjusted by Wehnelt potential, limited by exchangeable aperture down to 50 µm |
| Electron source | Tungsten-2% thoriated filament standard, single crystal LaB6 filament optional |
| Energy spread | 0.45 eV (thoriated - tungsten filament) |
| Overall size | 10 mm lens diameter and 80 mm length |
| Microchannel Plates | |
| Working area | 75 mm |
| L/D ratio | 40:1 |
| Channel diameter | 25 microns |
| Center to center spacing | 32 microns |
| Plate thickness | 1.0 mm |
| Bias angle | 8° |
| Electron gain | 104 to 105 per plate |
The LEED 800 MCP optics is controlled using either a LPS075-D or LPS300-D power supply. The LPS075-D is used to operate the optic in LEED mode only whereas the LPS300-D in conjunction with the LOA10-AES lock-in controller and AUS30 input coupler is used to operate the optics in LEED and AES modes. Integral shutter (Model ISH-8) and LaB6 filament (Model LaB6) are further options. The MCPS01/02 controllers are used for operation of the microchannel plates.
For more information, download LEED 800 MCP 100DEG Configuration Guide & Specifications (.pdf)